SIC Coated Graphite Tray

SIC coated graphite trays are generally made of high purity graphite as the matrix, and provide SIC coating with extremely high purity and theoretical density through CVD (chemical vapor deposition). The CVD SIC coating is very hard, and can be polished to a mirror-like surface. Besides, it has ultra-high purity and extremely high wear resistance. As the coated products have excellent performance in high vacuum and high temperature environments, so SIC coated graphite trays are very suitable for the semiconductor industry and other ultra-clean environments. They are mainly used as a substrate in the process of forming epitaxial layers on semiconductor wafers.

Ultra-high purity
Excellent thermal shock resistance
Excellent physical impact resistance
Machinability for complex shapes
Excellent chemical stability
Can be used in oxidizing atmospheres.

The SIC coated graphite tray is used as a base for fixing and heating semiconductor wafers during heat treatment. Energy can be absorbed and heat the chip through induction, conduction, or radiation, and its thermal shock resistance, thermal conductivity, and purity are essential for rapid thermal processing (RTP). In the silicon epitaxy process, the wafer is carried on a base, and the performance and quality of the base have a crucial effect on the quality of the wafer epitaxial layer.